Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics

Vasil Yanev, Mathias Rommel, Martin Lemberger, Silke Petersen, Brigitte Amon, Tobias Erlbacher, Anton J. Bauer, Heiner Ryssel, Albena Paskaleva, Wenke Weinreich, Christian Fachmann, Johannes Heitmann, Uwe Schroeder
  • Applied Physics Letters, January 2008, American Institute of Physics
  • DOI: 10.1063/1.2953068
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The following have contributed to this page: Dr. Mathias Rommel