What is it about?
This is about the preparation of silicon quantum dots on quartz plate using pulsed laser deposition(PLD) and its optical characterization. The change in property of the si nanocrystals with respect to the change in roughness of the quarts plate is also evaluated
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Why is it important?
Here Si nanocrystals were prepared by off axis PLD. PLD being a a cold wall processing is a promising technique which excites only a small area on the target by the focused laser beam. It is highly suited for the growth of quantum dots with high chemical purity and controlled stochiometry. In PLD, one can control size distribution of Si nanocrystals by varying the parameters such as target to substrate distance, laser fluence, background gas pressure, etc.
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This page is a summary of: Effect of substrate roughness on photoluminescence spectra of silicon nanocrystals grown by off axis pulsed laser deposition, Journal of Applied Physics, July 2006, American Institute of Physics, DOI: 10.1063/1.2209432.
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