Rearrangement of ferroelectric domain structure induced by chemical etching

  • V. Ya. Shur, A. I. Lobov, A. G. Shur, S. Kurimura, Y. Nomura, K. Terabe, X. Y. Liu, K. Kitamura
  • Applied Physics Letters, July 2005, American Institute of Physics
  • DOI: 10.1063/1.1993769

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http://dx.doi.org/10.1063/1.1993769

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