Exposure characteristics of cobalt fluoride (CoF2) self-developing electron-beam resist on sub-100 nm scale

  • Marek Malac, Marvin Schoefield, Yimei Zhu, Ray Egerton
  • Journal of Applied Physics, July 2002, American Institute of Physics
  • DOI: 10.1063/1.1487914

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http://dx.doi.org/10.1063/1.1487914

The following have contributed to this page: Professor Ray F Egerton