Publication not explained

This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.

If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.

Featured Image

Read the Original

This page is a summary of: One-mask process for silicon accelerometers on Pyrex glass utilising notching effect in inductively coupled plasma DRIE, Electronics Letters, January 2003, the Institution of Engineering and Technology (the IET),
DOI: 10.1049/el:20030407.
You can read the full text:

Read

Contributors

The following have contributed to this page