Effective improvement in the etching characteristics of Si{110} in Low concentration TMAH solution.

  • Veerla Swarnalatha, A. V. Narasimha Rao, Prem Pal
  • Micro & Nano Letters, April 2018, the Institution of Engineering and Technology (the IET)
  • DOI: 10.1049/mnl.2017.0610

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http://dx.doi.org/10.1049/mnl.2017.0610

The following have contributed to this page: Dr Prem Pal