Electrochemical Ostwald ripening and surface diffusion in the galvanic displacement reaction: control over particle growth

Tapas Ghosh, Prasanta Karmakar, Biswarup Satpati
  • RSC Advances, January 2015, Royal Society of Chemistry
  • DOI: 10.1039/c5ra20297c

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The following have contributed to this page: Biswarup Satpati