What is it about?
In the paper you can read about a new test method for interfacial mechanical testing of especially atomic layer deposited (ALD) thin films. The test method is generic and it can be applied to practically any coating-substrate-sphere-system. For demonstration we have used well know Al2O3 and TiO2 thin films on a silicon substrate and we have also used Finite Element Analysis (FEA) modeling to see what is going on. The method gives quantitative information about interfacial mechanical properties.
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Why is it important?
In the paper we present a new method for interfacial mechanical testing of especially atomic layer deposited (ALD) thin films. Good interfacial mechanical properties are essential for the practical use of any coating and traditional testing does now always give the sufficient information about film properties. Our method gives quantitative information about interfacial mechanical properties and it can be applied to practically any coating/substrate system.
Perspectives
In this paper the embedded microsphere method is further developed utilizing a new fully-programmable micro-robotic assembly for the measurement improving the repeatability and reliability of the measurements significantly.
Mr Jussi Lyytinen
Aalto-yliopisto
Read the Original
This page is a summary of: Interfacial mechanical testing of atomic layer deposited TiO2 and Al2O3 on a silicon substrate by the use of embedded SiO2 microspheres, RSC Advances, January 2014, Royal Society of Chemistry,
DOI: 10.1039/c4ra05807k.
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