A new low dielectric material with high thermostability based on a thermosetting trifluoromethyl substituted aromatic molecule

Fengkai He, Chao Yuan, Kai Li, Shen Diao, Kaikai Jin, Jiajia Wang, Jiawei Tong, Juan Ma, Qiang Fang
  • RSC Advances, January 2013, Royal Society of Chemistry
  • DOI: 10.1039/c3ra44991b

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http://dx.doi.org/10.1039/c3ra44991b

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