Laser photolytic studies on sensitizers for negative photoresists: 4,4′-diazido-3,3′-dimethoxybiphenyl in poly(methyl methacrylate) films

  • Akira Itaya, Takefumi Inoue, Tsutomu Yamamoto, Takahiro Nobutou, Hiroshi Miyasaka, Minoru Toriumi, Takumi Ueno
  • Journal of Materials Chemistry, January 1994, Royal Society of Chemistry
  • DOI: 10.1039/jm9940401539

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http://dx.doi.org/10.1039/jm9940401539

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