The isolation and structure of a highly stable, metallation-resistant and multiply hydrogen-bonded sulfonylamide–phosphine oxide adduct, PhSO2CH2C(O)NH2·OP(NMe2)3, PSA·HMPA (PSA = phenylsulfonylacetamide, HMPA = hexamethylphosphoramide)

Ian Cragg-Hine, Matthew G. Davidson, Andrew J. Edwards, Elinor Lamb, Paul R. Raithby, Ronald Snaith
  • Chemical Communications, January 1996, Royal Society of Chemistry
  • DOI: 10.1039/cc9960000153

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http://dx.doi.org/10.1039/cc9960000153

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