Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

  • Mathieu Salaun, Marc Zelsmann, Sophie Archambault, Dipu Borah, Nikolaos Kehagias, Claudia Simao, Olivier Lorret, Matthew T. Shaw, Clivia M. Sotomayor Torres, Mickael A. Morris
  • Journal of Materials Chemistry C, January 2013, Royal Society of Chemistry
  • DOI: 10.1039/c3tc30300d

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http://dx.doi.org/10.1039/c3tc30300d

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