Enhanced sulfur resistance of Ni/SiO2 catalyst for methanation via the plasma decomposition of nickel precursor

Xiaoliang Yan, Yuan Liu, Binran Zhao, Yong Wang, Chang-jun Liu
  • Physical Chemistry Chemical Physics, January 2013, Royal Society of Chemistry
  • DOI: 10.1039/c3cp50694k

Enhanced sulfur resistence of Ni catalyst

What is it about?

The plasma decomposition leads to a significant change in the nucleation and crystal growth of Ni catalyst, leading to smaller particle size, higher dispersion, more Ni(111) and enhanced the Ni-support interaction. The plasma decomposition operates at low temperatures (less than 200 degree C) and mostly applies highly energetic electrons and electron induced active species. This unique plasma decomposition is excellent for catalyst preparation with short time operation and lessenergy consumption

Why is it important?

The plasma decomposition of precursor leads to very different nucleation and crystal growth, leading to higher dispersion and enhanced metal-support interaction.

The following have contributed to this page: Chang-jun Liu

In partnership with: