An inorganic–organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns via photolithography

Chi Thanh Nguyen, Phan Huy Hoang, Jayakumar Perumal, Dong-Pyo Kim
  • Chemical Communications, January 2011, Royal Society of Chemistry
  • DOI: 10.1039/c0cc05836j
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