Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate

Jagan Singh Meena, Min-Ching Chu, Shiao-Wei Kuo, Feng-Chih Chang, Fu-Hsiang Ko
  • Physical Chemistry Chemical Physics, January 2010, Royal Society of Chemistry
  • DOI: 10.1039/b917604g
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