First-Principles Analyses and Predictions on the Reactivity of Barrier Layers of Ta and TaN toward Organometallic Precursors for Deposition of Copper Films

Eduardo Machado, Marcin Kaczmarski, Pablo Ordejón, Diwakar Garg, John Norman, Hansong Cheng
  • Langmuir, August 2005, American Chemical Society (ACS)
  • DOI: 10.1021/la050164z

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http://dx.doi.org/10.1021/la050164z

The following have contributed to this page: Professor Hansong Cheng