First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO 2 Thin Films with Di( sec -butylamino)silane and Ozone

Liang Huang, Bo Han, Bing Han, Agnes Derecskei-Kovacs, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Ronald M. Pearlstein, Haripin Chandra, Hansong Cheng
  • The Journal of Physical Chemistry C, September 2013, American Chemical Society (ACS)
  • DOI: 10.1021/jp405541x

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http://dx.doi.org/10.1021/jp405541x

The following have contributed to this page: Professor Hansong Cheng