On the Mechanisms of SiO 2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis( t -butylamino)silane on the Hydroxylated SiO 2 (001) Surface

Bo Han, Qingfan Zhang, Jinping Wu, Bing Han, Eugene J. Karwacki, Agnes Derecskei, Manchao Xiao, Xinjian Lei, Mark L. O’Neill, Hansong Cheng
  • The Journal of Physical Chemistry C, January 2012, American Chemical Society (ACS)
  • DOI: 10.1021/jp2094802

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http://dx.doi.org/10.1021/jp2094802

The following have contributed to this page: Professor Hansong Cheng