Atomic Layer Deposition of HfO 2 Using Alkoxides as Precursors

Collin Mui, Charles B. Musgrave
  • The Journal of Physical Chemistry, September 2004, American Chemical Society (ACS)
  • DOI: 10.1021/jp037507r

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http://dx.doi.org/10.1021/jp037507r

The following have contributed to this page: Charles Musgrave