Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

K. E. Uhrich, E. Reichmanis, S. A. Heffner, J. M. Kometani, O. Nalamasu
  • Chemistry of Materials, March 1994, American Chemical Society (ACS)
  • DOI: 10.1021/cm00039a007

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The following have contributed to this page: Kathryn Uhrich