New Directions in the Design of Chemically Amplified Resists

E. Reichmanis, M. E. Galvin, K. E. Uhrich, P. Mirau, S. A. Heffner
  • May 1995, American Chemical Society (ACS)
  • DOI: 10.1021/bk-1994-0579.ch005

The authors haven't finished explaining this publication. If you are the author, sign in to claim or explain your work.

Read Publication

The following have contributed to this page: Kathryn Uhrich