New Directions in the Design of Chemically Amplified Resists

E. Reichmanis, M. E. Galvin, K. E. Uhrich, P. Mirau, S. A. Heffner
  • May 1995, American Chemical Society (ACS)
  • DOI: 10.1021/bk-1994-0579.ch005

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http://dx.doi.org/10.1021/bk-1994-0579.ch005

The following have contributed to this page: Kathryn Uhrich