Ultrafast Reactions of a Key Chip-Making Chemical Under High-Energy Light

What is it about?

In this study, we explored what happens to a key chemical used in computer chip manufacturing, phenyl triflate (Ph–O–SO₂–CF₃), when it’s exposed to extremely high-energy light, similar to the conditions in advanced lithography processes. This chemical helps create the fine patterns needed to build modern microchips. Using ultrafast techniques that allowed us to observe changes happening in just trillionths of a second, we watched as the molecule broke apart and rearranged. We found that it undergoes a complex reaction: sulfur dioxide (SO₂) is released, and the CF₃ group (trifluoromethyl) reattaches to form a new structure. During this process, part of the molecule also twists in a characteristic way, creating a repeating vibrational motion. By combining these real-time observations with electronic structure calculations, we were able to capture a detailed picture of how phenyl triflate behaves under these intense conditions. Our findings offer valuable insight into the ultrafast chemistry behind photoacid generators and could help improve the materials used in next-generation chip manufacturing.

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Why is it important?

This study is important because it reveals, in real time, how a key photoacid generator used in advanced chip manufacturing breaks apart and reforms when exposed to high-energy light. We observed the ultrafast release of SO₂ and H⁺, the reattachment of the CF₃ group, and a distinct molecular twisting motion—all within trillionths of a second. These findings provide new insight into the fundamental chemistry behind EUV lithography and can help improve the design of photoactive materials, leading to more efficient, precise, and reliable processes for next-generation semiconductor fabrication.

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