Manganese materials from plasma assisted vapor deposition
What is it about?
Manganese-based nanomaterials are important for various applications, like catalysis, sensing, charge storage. Manganese fluorides, for example, would be excellent anodes for rechargeable lithium batteries. Unfortunately, it is still very difficult to produce these materials with precise composition and structure, as required by most applications. Plasma Assisted-Chemical Vapor Deposition (PA-CVD) could be a viable synthetic strategy. In this method, the substrate is exposed to volatile molecular precursors in the presence of plasma - a partially ionized gas, containing free electrons. These energetic electrons can trigger processes that would otherwise be very improbable at normal conditions, such as dissociation of precursor molecules and growth of the material. Hence, plasma facilitates the precursor reactions on the substrate surface, but there are very few manganese precursors suitable for this technique. In the present work, we have designed and synthesized two manganese complexes to be used as precursor molecules for the fabrication of manganese oxides and fluorides via plasma-assisted CVD.
Why is it important?
We performed a thorough study of the new precursors, using both experimental and computational methods. We revealed the microscopic behavior of their molecular ions and their potential for the target applications. Both compounds, containing diketonate and diamine ligands, are easy to prepare, stable at room conditions and very volatile. Their decomposition reactions involve the initial loss of either the diamine or the diketonate ligand. Preliminar deposition experiments were successful, paving the way to the application of these precursors in PA-CVD processes. Interestingly, the composition of the nanomaterials can be changed from Mn fluorides to oxides simply by adding oxygen to the transport gas.
The following have contributed to this page: Gloria Tabacchi