Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Anthoula C. Papageorgiou, Sybille Fischer, Seung Cheol Oh, Özge Sağlam, Joachim Reichert, Alissa Wiengarten, Knud Seufert, Saranyan Vijayaraghavan, David Écija, Willi Auwärter, Francesco Allegretti, Robert G. Acres, Kevin C. Prince, Katharina Diller, Florian Klappenberger, Johannes V. Barth
  • ACS Nano, May 2013, American Chemical Society (ACS)
  • DOI: 10.1021/nn401171z

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http://dx.doi.org/10.1021/nn401171z

The following have contributed to this page: Dr Francesco Allegretti