Regulation of Pattern Dimension as a Function of Vacuum Pressure: Alkyl Monolayer Lithography

  • Om P. Khatri, Hikaru Sano, Kuniaki Murase, Hiroyuki Sugimura
  • Langmuir, October 2008, American Chemical Society (ACS)
  • DOI: 10.1021/la8021613

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The following have contributed to this page: Om P Khatri