A Quantum Chemical Study of the Atomic Layer Deposition of Al 2 O 3 Using AlCl 3 and H 2 O as Precursors

Annica Heyman, Charles B. Musgrave
  • The Journal of Physical Chemistry B, May 2004, American Chemical Society (ACS)
  • DOI: 10.1021/jp049762x
The author haven't finished explaining this publicationThe author haven't finished explaining this publication

The following have contributed to this page: Charles Musgrave