Atmospheric Pressure Chemical Vapor Deposition of Titanium Aluminum Nitride Films

  • Joseph T. Scheper, Kapila Wadu Mesthrige, James W. Proscia, Gang-Yu Liu, Charles H. Winter
  • Chemistry of Materials, December 1999, American Chemical Society (ACS)
  • DOI: 10.1021/cm990157u

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http://dx.doi.org/10.1021/cm990157u