Nonaqueous Atomic Layer Deposition of Aluminum Phosphate

Stefan Knohl, Amit K. Roy, Ralf Lungwitz, Stefan Spange, Thomas Mäder, Daisy J. Nestler, Bernhard Wielage, Steffen Schulze, Michael Hietschold, Harm Wulff, Christiane A. Helm, Falko Seidel, Dietrich R. T. Zahn, Werner A. Goedel
  • ACS Applied Materials & Interfaces, June 2013, American Chemical Society (ACS)
  • DOI: 10.1021/am401092z
The author haven't finished explaining this publicationThe author haven't finished explaining this publication
Read Publication

http://dx.doi.org/10.1021/am401092z

The following have contributed to this page: Professor Dietrich RT Zahn