Nonaqueous Atomic Layer Deposition of Aluminum Phosphate

Stefan Knohl, Amit K. Roy, Ralf Lungwitz, Stefan Spange, Thomas Mäder, Daisy J. Nestler, Bernhard Wielage, Steffen Schulze, Michael Hietschold, Harm Wulff, Christiane A. Helm, Falko Seidel, Dietrich R. T. Zahn, Werner A. Goedel
  • ACS Applied Materials & Interfaces, June 2013, American Chemical Society (ACS)
  • DOI: 10.1021/am401092z
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