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This page is a summary of: Use of the ‘mist’ (liquid-source) deposition system to produce new high-dielectric devices: ferroelectric-filled photonic crystals and Hf-oxide and related buffer layers for ferroelectric-gate FETs, Microelectronic Engineering, April 2003, Elsevier,
DOI: 10.1016/s0167-9317(02)00970-x.
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