Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask

A. Barnabé, M. Lalanne, L. Presmanes, J.M. Soon, Ph. Tailhades, C. Dumas, J. Grisolia, A. Arbouet, V. Paillard, G. BenAssayag, M.A.F. van den Boogaart, V. Savu, J. Brugger, P. Normand
  • Thin Solid Films, December 2009, Elsevier
  • DOI: 10.1016/j.tsf.2009.03.232

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http://dx.doi.org/10.1016/j.tsf.2009.03.232

The following have contributed to this page: Philippe Tailhades