On the lower thickness boundary of sputtered TiNi films for shape memory application

Y.Q. Fu, Sam Zhang, M.J. Wu, W.M. Huang, H.J. Du, J.K. Luo, A.J. Flewitt, W.I. Milne
  • Thin Solid Films, September 2006, Elsevier
  • DOI: 10.1016/j.tsf.2005.12.039

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http://dx.doi.org/10.1016/j.tsf.2005.12.039

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