What is it about?
This article explained about the prospective carrier selective design for future Si HJ solar PV technology. Both cost effectiveness and thermal budget consideration the passivation materials choice and its advancement pathways towards massive industrial development are focused in this study. Si isoelectronic SiO2 interface with metal alike heavily doped polySi to un-doped metal oxides are shown better scope of Si HJ passivation and carrier selectivity.
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Why is it important?
It is so important to lessen device interface defects, device efficiency and thermal stability. In this purpose massive technological shift from current back surface field contact is essential. This study is focused that directions.
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This page is a summary of: Recent advancements in carrier-selective contacts for high-efficiency crystalline silicon solar cells: Industrially evolving approach, Nano Energy, May 2022, Elsevier,
DOI: 10.1016/j.nanoen.2021.106899.
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