Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution

Y.Q. Fu, J.K. Luo, S.B. Milne, A.J. Flewitt, W.I. Milne
  • Materials Science and Engineering B, December 2005, Elsevier
  • DOI: 10.1016/j.mseb.2005.08.104

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http://dx.doi.org/10.1016/j.mseb.2005.08.104

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