Cyclic alkylsilanes as low-pressure chemical vapor deposition silicon dioxide precursors

Ravi Kumar Laxman, Arthur K. Hochberg, Hansong Cheng, David A. Roberts
  • Thin Solid Films, July 1995, Elsevier
  • DOI: 10.1016/0040-6090(95)06541-5

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http://dx.doi.org/10.1016/0040-6090(95)06541-5

The following have contributed to this page: Professor Hansong Cheng