Electron capture kinetics at AlF3/SiO2 interfaces

I. Thurzo, T.U. Kampen, D.R.T. Zahn, D. König
  • Applied Surface Science, May 2003, Elsevier
  • DOI: 10.1016/s0169-4332(03)00043-6

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http://dx.doi.org/10.1016/s0169-4332(03)00043-6

The following have contributed to this page: Professor Dietrich RT Zahn