Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-k SiO2 xerogel films

C Murray, C Flannery, I Streiter, S.E Schulz, M.R Baklanov, K.P Mogilnikov, C Himcinschi, M Friedrich, D.R.T Zahn, T Gessner
  • Microelectronic Engineering, January 2002, Elsevier
  • DOI: 10.1016/s0167-9317(01)00589-5
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http://dx.doi.org/10.1016/s0167-9317(01)00589-5

The following have contributed to this page: Professor Dietrich RT Zahn