Conductance transient, capacitance–voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films

  • S. Dueñas, H. Castán, J. Barbolla, K. Kukli, M. Ritala, M. Leskelä
  • Solid-State Electronics, October 2003, Elsevier
  • DOI: 10.1016/s0038-1101(03)00172-2

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http://dx.doi.org/10.1016/s0038-1101(03)00172-2