Conductance transient, capacitance–voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films

• S. Dueñas, H. Castán, J. Barbolla, K. Kukli, M. Ritala, M. Leskelä

• Solid-State Electronics, October 2003, Elsevier
• DOI: 10.1016/s0038-1101(03)00172-2