Resist pattern peeling assessment in DUV chemically amplified resist

Sohan Singh Mehta, Sun Hai Qin, Moitreyee Mukherjee-Roy, Navab Singh, Rakesh Kumar
  • Microelectronics Journal, May 2004, Elsevier
  • DOI: 10.1016/j.mejo.2004.01.003
The author haven't finished explaining this publicationThe author haven't finished explaining this publication

The following have contributed to this page: Mr. Sohan S Mehta