Fabrication of high-aspect-ratio pattern via high throughput roll-to-roll ultraviolet nanoimprint lithography

Hiroshi Yoshikawa, Jun Taniguchi, Go Tazaki, Toshiyuki Zento
  • Microelectronic Engineering, December 2013, Elsevier
  • DOI: 10.1016/j.mee.2013.03.117

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The following have contributed to this page: Dr Jun Taniguchi