Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching

M. Rommel, M. Rumler, A. Haas, A.J. Bauer, L. Frey
  • Microelectronic Engineering, October 2013, Elsevier
  • DOI: 10.1016/j.mee.2013.03.081
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The following have contributed to this page: Dr. Mathias Rommel