UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

H. Schmitt, B. Amon, S. Beuer, S. Petersen, M. Rommel, A.J. Bauer, H. Ryssel
  • Microelectronic Engineering, April 2009, Elsevier
  • DOI: 10.1016/j.mee.2008.11.017
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The following have contributed to this page: Dr. Mathias Rommel