Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma

A.M Efremov, Dong-Pyo Kim, Kyoung-Tae Kim, Chang-Il Kim
  • Microelectronic Engineering, January 2004, Elsevier
  • DOI: 10.1016/j.mee.2003.09.001

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http://dx.doi.org/10.1016/j.mee.2003.09.001