Ta2O5-based high-K dielectric thin films from solution processed at low temperatures

Raluca C. Frunză, Brigita Kmet, Marko Jankovec, Marko Topič, Barbara Malič
  • Materials Research Bulletin, February 2014, Elsevier
  • DOI: 10.1016/j.materresbull.2013.11.025

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http://dx.doi.org/10.1016/j.materresbull.2013.11.025