Characterization of trimethylaluminum-N2O—He glow discharge in plasma-enhanced chemical vapor deposition of aluminum oxide films

  • Yong-Chun Kim, John S. Chun, Won-Jong Lee
  • Thin Solid Films, March 1995, Elsevier
  • DOI: 10.1016/0040-6090(95)80048-4

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http://dx.doi.org/10.1016/0040-6090(95)80048-4