Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering

Hao Jin, Bin Feng, Shurong Dong, Changjian Zhou, Jian Zhou, Yi Yang, Tianling Ren, Jikui Luo, Demiao Wang
  • Journal of Electronic Materials, March 2012, Springer Science + Business Media
  • DOI: 10.1007/s11664-012-1999-4

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http://dx.doi.org/10.1007/s11664-012-1999-4

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