Development of a diffusion barrier layer for silicon and carbon in molybdenum—a physical vapor deposition approach

S. Govindarajan, J. J. Moore, C. Suryanarayana, J. Disam
  • Metallurgical and Materials Transactions A, March 1999, Springer Science + Business Media
  • DOI: 10.1007/s11661-999-0072-2

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http://dx.doi.org/10.1007/s11661-999-0072-2

The following have contributed to this page: Professor C Suryanarayana