Resistive switching of in situ and ex situ oxygen plasma treated ZnO thin film deposited by atomic layer deposition

Jian Zhang, Hui Yang, Qilong Zhang, Hao Jiang, Jikui Luo, Juehui Zhou, Shurong Dong
  • Applied Physics A, February 2014, Springer Science + Business Media
  • DOI: 10.1007/s00339-014-8324-4

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http://dx.doi.org/10.1007/s00339-014-8324-4

The following have contributed to this page: Jack Luo (Jikui Luo)

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