X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth

Kyoung-Keun Lee, Kevin Doyle, Jessica Chai, John H. Dinan, Thomas H. Myers
  • Journal of Electronic Materials, April 2012, Springer Science + Business Media
  • DOI: 10.1007/s11664-012-2085-7

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http://dx.doi.org/10.1007/s11664-012-2085-7

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