Cross-sectional AFM study of etching kinetics of oxidized porous silicon

  • J. C. Poler, Thomas A. Schmedake, Weijun Ye
  • physica status solidi (a), March 2004, Wiley
  • DOI: 10.1002/pssa.200306767

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http://dx.doi.org/10.1002/pssa.200306767

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