What is it about?

The high laser damage threshold and moderate conductivity of Ga2O3 are leveraged to demonstrate the first Ga2O3‐based laser accelerator and show Ga2O3 as a promising material for high‐power optical applications. With the distinct properties of Ga2O3 combined with advances in fabrication and wafer growth techniques, more Ga2O3‐based high‐power optical applications will be realized in the near future.

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Why is it important?

Demonstrated Ga2O3 as a promising optical material, especially for high-power applications. Showed Ga2O3 film used on Si-based photonic devices. Presented high damage tolerance of Ga2O3-based nanostructures, on par with robust materials like sapphire (Al2O3). Reported the first novel materials based dielectric laser accelerator.

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This page is a summary of: Gallium Oxide for High‐Power Optical Applications, Advanced Optical Materials, January 2020, Wiley,
DOI: 10.1002/adom.201901522.
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